MRL

Materials Research Laboratory

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CMM- Accelerator-based Techniques for Analysis

Instrumentation for Accelerator-based Techniques for Analysis:

Accelerator-based Techniques for Analysis

Staff Contact:



Doug Jeffers
(217) 333-1383
jeffers@illinois.edu

Professor Ivan Petrov- Director
(217) 333-8396
petrov@illinois.edu

Professor Robert Averback
(217) 333-4302
raverbac@uy.ncsa.uiuc.edu

High Voltage Engineering Van de Graaff

Location
B70 Materials Research Laboratory

General
The Van de Graaff operates at energies up to 2.3 MeV for H, He, Ar, Kr , Xe and Ne with 1-2-3 mm beam-size apertures. There is a beam line for Rutherford backscattering spectroscopy (RBS), elastic recoil detection. Nondestructive depth profiles of thin films can be obtained as deeply as several microns into the sample. Available source gases include H, He, Ne, Ar, and Kr. The sample goniometer can be set to allow or prevent channeling.