Materials Research Laboratory
CMM- Surface Analysis
Surface Analysis Techniques:
Surface Analysis Techniques
Auger Electron Spectroscopy (AES)
Auger electron spectroscopy (AES) is a surface sensitive analytical technique used mainly to determine elemental
compositions of materials and, in certain cases to identify the chemical states of surface atoms. With AES, a
primary electron beam is used to excite secondary and Auger electrons. If a scanning primary beam is used, the
secondary electron images yield information related to surface topography. Auger electrons, when analyzed as a
function of energy, are used to identify the elements and chemical states present. The information depth for Auger
analysis is the top 2-20 atomic layers, and can be used in depth profiling applications in conjunction with
ion beam sputtering.
Secondary Ion Mass Spectrometry (SIMS)
In secondary ion mass spectrometry (SIMS) a focused ion beam is directed to a solid surface, removing material in
the form of neutral and ionized atoms and molecules. The secondary ions are then accelerated into a mass spectrometer
and separated according to their mass-to-charge ratio.
Surface Profilometry
Surface profilometry is a technique in which a diamond stylus, in contact with a sample, can measure minute physical
surface variations as a function of position.
X-ray Photoelectron Spectroscopy (XPS)
In X-ray photoelectron spectroscopy (XPS)- also called electron spectroscopy for chemical analysis (ESCA)- X-rays
excite photoelectrons, and the emitted electron signal is plotted as a spectrum of binding energies. Differing chemical
states resulting from compound formation are reflected in the photoelectron peak positions and shapes. Spectral information
is collected from a depth of 2-20 atomic layers, depending on the material studied.