Materials Research Laboratory
CMM- Scanning Electron Microscopy (SEM) and
Focussed Ion Beam (FIB)
Instrumentation for SEM and FIB:
SEM Instruments
- Hitachi S4800 High Resolution SEM
- Hitachi S4700 High Resolution SEM
- FEI Dual Beam 235 FIB
- JEOL 7000F Analytical SEM
- JEOL 6060LV General Purpose SEM
Scanning Electron Microscopy (SEM) and Focussed Ion Beam (FIB)
Staff Contact:
FIB |
JEOL 7000F |
Hitachi S4800 |
Background
SEM is used to study topography, morphology and local chemical and phase composition from nanometers to millimeters. Study crystallographic relationships including texture, boundary character, strain, deformation mechanisms through electron diffraction. Identify phases. Spectroscopically study electron beam induced light emission (cathodoluminescence) of materials from room to Liquid He temperature. Microscopes include a high resolution cold field emission SEM, an analytical Schottky source SEM equipped with EDS, WDS, EBSD, CL, and a He cold stage, and a low vacuum general purpose SEM. An instrument combining a focused Ga ion beam with a high resolution SEM provides nanofabrication and site-specific sample preparation capabilities.