Materials Research Laboratory
CMM- X-ray Photoelectron Spectroscopy (XPS)
Instrumentation for X-ray Photoelectron Spectroscopy:
XPS Instruments
Staff Contact:
Rick Haasch
(217) 244-2974
r-haasch@illinois.edu
Physical Electronics PHI 5400
General
The PHI 5400 is a general purpose photoelectron spectrometer for
X-ray and ultraviolet photoelectron spectroscopy (XPS) and (UPS). The system has a differentially
pumped argon ion gun for sputter cleaning and depth profiling. A key feature of this system is its
applicability to a wide range of sample types and ease-of-use.
Location
B08 Materials Research Laboratory
| Features | |
| Excitation Sources | |
| Dual Anode X-ray Source: | Mg, Al |
| Monochromatic Xray Source: | Al |
| Ultraviolet Source: | He I, He II |
| Detection System | |
| Small Area Extraction Optics: | 0.2, 0.5, 1.0, and 1 mm x 3.5 mm |
| Spherical Capacitor Electron Energy Analyzer | |
| Spherical Capacitor Electron Energy Analyzer | |
| Dual Channel Plate Position Sensitive Detector | |
| Sputtering System | |
| Differentially Pumped 1-5 KeV Ion Gun with Automatic Leak Valve |
For More Information
Contact:
Rick Haasch
Center for Microanalysis of Materials
Frederick Seitz Materials Research Laboratory
104 S. Goodwin Avenue
Urbana, IL 61801 USA
(217) 244-2974
r-haasch@illinois.edu