Course: X-Ray Photoelectron Spectroscopy (XPS/ESCA) 

Course Objectives

  • Learn about optimizing the analysis of surfaces with x-ray photoelectron spectroscopy (XPS) -- also known as electron spectroscopy for chemical analysis (ESCA).
  • Learn approaches for quantitative analysis.
  • Learn the types of problems that can be solved with XPS/ESCA.

  • Know the latest developments in instrumentation.

Course Description
XPS is used to determine the atoms present at a surface and their concentrations, chemistry, and lateral and depth distributions. This course emphasizes:

  • The principles of XPS -- production of photo-electrons, electron escape depth, surface sensitivity, plasmons, and final-state effects.
  • Instrumentation -- x-ray sources, satellites, analyzers, detectors, analyzed area, nonhomogeneous specimens, photoelectron diffraction, small-area analysis, and imaging.
  • Qualitative analysis -- identification of elements, energy scale calibration, chemical shift, relaxation effects, Auger parameters, peak widths, and line shapes.
  • Quantitative analysis -- approaches, photoelectron cross-sections, asymmetry parameters, analyzer transmission, sensitivity factors, detection limits, and the effect of thin overlayers.
  • Artifacts -- x-ray satellites, ghost peaks, x-ray damage, and specimen charging and handling.
  • Data processing -- analog and digital acquisition, background subtraction, measurement of peak area, x-ray satellite removal, curve-fitting, and deconvolution.
  • Applications to solve surface-related problems.
  • Approaches for depth profiling -- angular studies, inelastic losses, and sputtering.
  • Instrument selection.     

Who Should Attend?
Scientists, engineers, students, and technicians who would like to understand the use of XPS/ESCA for surface analysis.        

Instructor:  
John Grant, Senior Research Scientist, Research Institute, University of Dayton

Course Materials:
Course Notes

Cost: $575.00


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