Properties study of e-beam deposited Pt nano-interconnects

Lolita Rotkina, Seongshik Oh, James N. Eckstein 

(Beckman Institute for Advanced Science and Technology, University of Illinois at Urbana-Champaign)

Connecting nano-objects to macroscopic leads is a tough technical problem of nanotechnology. In this work direct electron beam induced deposition of Pt from metal-organic precursor has been used to form nano-interconnects. For example, nanotubes and nanowires, silicide needle-like islands, semiconducting nanocrystals and other nanostructures have been wired to metal leads to perform transport measurements. Material properties of deposited nano-interconnects are in focus of this study.

Chemical composition of deposit has been studied by Auger spectroscopy and Transmission Electron Microscopy. The content (not yield!) of the deposited material was shown to be independent on the beam current and accelerating voltage. The content was contingent on the rate of pumping-out of decomposed precursor residue.

Conductivity of the nano-interconnects have been improved dramatically by annealing in nitrogen atmosphere. Structural and material properties of deposit, annealed in the temperature range 100 to 600 C, were studied.