DESIGN AND APPLICATION OF A X-RAY PHOTOELECTRON SPECTROMETER EQUIPPED WITH TWIN HEMISPHERICAL ENERGY ANAYZERS

Michael J. Prokosch

Corporate Analytical Technology Center

3M Co.

3M Center, St. Paul, MN

X-ray photoelectron spectroscopy is our method of choice for the quantitative determination of thin surface layers. Requirements for higher throughput, larger sample size and for other unique analysis requirements stretched the capabilities of our conventional XPS spectrometers. The investigation and design of low cost, multi-operator x-ray photoelectron spectrometers was initiated in the late 1980’s at 3M. Several successful designs were produced and have culminated with the production of a twin hemispherical energy analyzer equipped x-ray photoelectron spectrometer, the TA-M. A review of the earlier instrument designs, their strengths and weaknesses, will give the rationale for the design of this spectrometer.

The addition of the second hemispherical energy analyzer in this instrument allowed simultaneous analysis of either spatially resolved, angle resolved or electronically unique features of a sample. Other design features addressed the robustness of the instrument and the ability to present large samples to the focal plane of the analyzers. This presentation will discuss the design of this instrument and present some of the novel applications that we have used to characterize materials.